Laser Plasma X-Ray Source And Its Application To Lithography

K. A. Tanaka; H. Aritome; T. Kanabe; M. Nakatsuka; T. Yamanaka; S. Nakai

doi:10.1117/12.961844

27 November 1989 Laser Plasma X-Ray Source And Its Application To Lithography

K. A. Tanaka, H. Aritome, T. Kanabe, M. Nakatsuka, T. Yamanaka, S. Nakai

Proceedings Volume 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation; (1989) https://doi.org/10.1117/12.961844
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Laser plasma is a unique source of high brightness ( > 10¹⁰ W/cm²) and pulsive ( <10^-9 sec. ) x rays. X-ray spectrum and intensity can be controlled by carefully choosing various experimental parameters such as laser wavelength, target material, and laser pulse width. These detailed knowledge of laser plasma x rays (LAPLAX) may be used for many applications. X-ray lithography is one such example, which is to achieve less than a few thousand Å spatial resolution. Making use of LAPLAX,we propose a conceptual design of an x-ray lithography system.

Citation Download Citation

K. A. Tanaka, H. Aritome, T. Kanabe, M. Nakatsuka, T. Yamanaka, and S. Nakai "Laser Plasma X-Ray Source And Its Application To Lithography", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961844

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