Reflectivity Measurements Of Multilayer X-Ray Mirrors At Normal Incidence

A. V. Vinogradov; I. V. Kozhevnikov; V. E. Levashov; S. I. Sagitov; V. A, Chirkov; V. V. Kondrateriko; I. F. Mikhailov; A. I. Fedorenko; I. I. Lyakhovskaya

doi:10.1117/12.961873

27 November 1989 Reflectivity Measurements Of Multilayer X-Ray Mirrors At Normal Incidence

A. V. Vinogradov, I. V. Kozhevnikov, V. E. Levashov, S. I. Sagitov, V. A, Chirkov, V. V. Kondrateriko, I. F. Mikhailov, A. I. Fedorenko, I. I. Lyakhovskaya

Author Affiliations +

Proceedings Volume 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation; (1989) https://doi.org/10.1117/12.961873
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Evaporated and sputtered multilayer mirrors consisting of the layers Ti-Si, Nb-Si, Mo-Si and Ti-Be for the wavelength range λ = 30-35 nm are synthesized on flat and spherical substrates. Preliminary measurements are carried out at sliding incidence for λ = 0.154 nm (CuKa∝ ) and for the range λ = 10-21 nm. To measure the reflectivity under normal incidence for the wavelengths range λ ~30-35 nm an experimental method of studying point X-ray source image is developed. Plasma from the focused laser beam at the surface of sulphur is used as an X-ray source. This source and its image produced by multilayer spherical mirror are studied simultaneously with XUV spectrograph of spatial resolution. The comparison of the spectra of the source, which contains many lines and its image, enables one to find the spectral dependence of mirror reflectivity at nearly normal incidence (for incidence angle up to 0.1° ) . Another facility was used for flat multilayer reflectivity measurement at λ~10 - 21 nm Experimental reflectivities in this range are up to 51 %.

Citation Download Citation

A. V. Vinogradov, I. V. Kozhevnikov, V. E. Levashov, S. I. Sagitov, V. A, Chirkov, V. V. Kondrateriko, I. F. Mikhailov, A. I. Fedorenko, and I. I. Lyakhovskaya "Reflectivity Measurements Of Multilayer X-Ray Mirrors At Normal Incidence", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961873

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available