Highly sensitive positive resists for holography

Kunihiro Ichimura; Yasushi Ohe

doi:10.1117/12.17969

1 May 1990 Highly sensitive positive resists for holography

Kunihiro Ichimura, Yasushi Ohe

Proceedings Volume 1212, Practical Holography IV; (1990) https://doi.org/10.1117/12.17969
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

New visibile llight sensitive positive type resists have been developed. The chemistry is based on the hydrolysis of polymers catalyzed by acid which is generated on sensitized photodecomposition of diphenyliodonium (DPI) salt. Dimethoxybenzhydryl methacrylate (DMOBHMA)-phenyl methacrylate (PhMA) copolymer was the best acid sensitive polymer tested, producing photoresists with sensitivity to an argon ion laser light and good holographic properties.

Citation Download Citation

Kunihiro Ichimura and Yasushi Ohe "Highly sensitive positive resists for holography", Proc. SPIE 1212, Practical Holography IV, (1 May 1990); https://doi.org/10.1117/12.17969

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available