Projecting uniformity subwavelength pattern by plasmonic lithography with unidirectional surface plasmon coupler

Shuxia Zhang; Baoji Wang; Xiaolin Cai; Qin Wang; Weiyang Yu; Xiaohua Li; Erguang Jia; Yingying Zhu; Xuefeng Yang

doi:10.1117/12.2605592

15 February 2022 Projecting uniformity subwavelength pattern by plasmonic lithography with unidirectional surface plasmon coupler

Shuxia Zhang, Baoji Wang, Xiaolin Cai, Qin Wang, Weiyang Yu, Xiaohua Li, Erguang Jia, Yingying Zhu, Xuefeng Yang

Author Affiliations +

Proceedings Volume 12166, Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021); 121660N (2022) https://doi.org/10.1117/12.2605592
Event: Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021), 2021, Hong Kong, Hong Kong

Abstract

A subwavelength interference nanolithography scheme is numerically demonstrated based on a metallic-insulator-metallic waveguide (MIMW) combined with two symmetrical surface plasmon unidirectional couplers. The unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated form onside of this nanoslit. Simulation results show that a feature size of 50 nm half-pitch and a depth of 100 nm uniformity pattern can be obtained at the working wavelength of 365 nm with the proposed scheme. This proposed scheme can enhance the intensity of the interference pattern with higher contrast and larger field depth which is advantageous to the fabrication process in practical applications.

Citation Download Citation

Shuxia Zhang, Baoji Wang, Xiaolin Cai, Qin Wang, Weiyang Yu, Xiaohua Li, Erguang Jia, Yingying Zhu, and Xuefeng Yang "Projecting uniformity subwavelength pattern by plasmonic lithography with unidirectional surface plasmon coupler", Proc. SPIE 12166, Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021), 121660N (15 February 2022); https://doi.org/10.1117/12.2605592

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