Automatic optical detection and classification of submicron defects on e-beam mask blanks

Richard Schneider; Dieter Spriegel

doi:10.1117/12.20242

1 August 1990 Automatic optical detection and classification of submicron defects on e-beam mask blanks

Richard Schneider, Dieter Spriegel

Proceedings Volume 1265, Industrial Inspection II; (1990) https://doi.org/10.1117/12.20242
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

The increasing integration of semiconductor circuits requires absolutely defect-free masks. Before their exposure to an c-beam writer the unstructured masks (blanks) have to be inspected in a clean room environment for particles on surfaces, pin-holes in the chromium layer and inclusions or scratches in the glass. Based on a HeNe laser scanner and by comparing relative directions and intensities of the scattered light, the position, size and type of defects were automatically classified. The criteria for classification will be explained. The smallest detectable defect diameter was 0.3 p.m. For presentation under a TV-microscope each defect could be located within 100 m.

Citation Download Citation

Richard Schneider and Dieter Spriegel "Automatic optical detection and classification of submicron defects on e-beam mask blanks", Proc. SPIE 1265, Industrial Inspection II, (1 August 1990); https://doi.org/10.1117/12.20242

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