Paper
26 June 2023 Clothing pattern recognition based on attention mechanism and mask RCNN network
Author Affiliations +
Abstract
Clothing pattern recognition on social media is a key application of Internet marketing, but it is currently implemented manually, which is very inefficient. Our goal is to solve this problem through artificial intelligence. Based on the improved Mask RCNN network, this paper introduces the attention mechanism SENet to enable the feature extractor to extract the target areas that need to be focused on. And put more weight on this part to highlight significant useful features. And this article contributes a whole new dataset of clothing versions. The comparison experiment verifies that the improved Mask RCNN network has been significantly improved in the pattern recognition of clothing.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luohan Wang, Diming Zhang, and Zhenxing Li "Clothing pattern recognition based on attention mechanism and mask RCNN network", Proc. SPIE 12721, Second International Symposium on Computer Applications and Information Systems (ISCAIS 2023), 1272111 (26 June 2023); https://doi.org/10.1117/12.2683289
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KEYWORDS
Image segmentation

Education and training

Target detection

Pattern recognition

Data modeling

Object detection

Feature extraction

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