Selective laser-induced etching (SLE) of transparent materials for microelectronic components and quantum computing applications

Christian Peters; Martin Kratz; Jana Köller; Sandra Borzek; Sebastian Simeth

doi:10.1117/12.2692475

12 March 2024 Selective laser-induced etching (SLE) of transparent materials for microelectronic components and quantum computing applications

Christian Peters, Martin Kratz, Jana Köller, Sandra Borzek, Sebastian Simeth

Author Affiliations +

Proceedings Volume 12873, Laser-based Micro- and Nanoprocessing XVIII; 128730A (2024) https://doi.org/10.1117/12.2692475
Event: SPIE LASE, 2024, San Francisco, California, United States

Abstract

Selective Laser-induced Etching (SLE) is a laser-based process which enables the fabrication of three-dimensional parts from transparent materials with an enormous freedom of geometry and micrometer precision. A current research focus for the SLE process is the development and fabrication of ion traps made of fused silica for the ion-based approach of quantum computing. With the help of micrometer-sized electrically controllable components, ions are trapped inside an electrical field and their state is manipulated by means of laser radiation in the context of complex computing operations. Another research focus is the fabrication of fiber-chip couplers which are necessary components of smallest laser sources with the purpose to minimize and simplify the current complex experimental setup of a quantum computer. This work presents the current development of laser / SLE-based processes for the fabrication of microelectronic devices and quantum computing applications.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Christian Peters, Martin Kratz, Jana Köller, Sandra Borzek, and Sebastian Simeth "Selective laser-induced etching (SLE) of transparent materials for microelectronic components and quantum computing applications", Proc. SPIE 12873, Laser-based Micro- and Nanoprocessing XVIII, 128730A (12 March 2024); https://doi.org/10.1117/12.2692475

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