Novel base-generating photoinitiators for deep-UV lithography

Charles Kutal; Scott K. Weit; Robert D. Allen; Scott A. MacDonald; C. Grant Willson

doi:10.1117/12.46384

1 June 1991 Novel base-generating photoinitiators for deep-UV lithography

Charles Kutal, Scott K. Weit, Robert D. Allen, Scott A. MacDonald, C. Grant Willson

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46384
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Thin films composed of the copolymer of glycidyl methacrylate-ethyl acrylate and cobalt(III) ammine or alkylamine salts as photoinitiators undergo crosslinking upon deep-uv irradiation and subsequent heating. The mechanism of crosslinking involves nucleophilic attack by photoliberated am(m)ime base on the epoxide ring of the copolymer. The quantum efficiency for photodecomposition of the cobalt(III) salts is about 1% at 254 nm. Oxygen plasma etching studies suggest that the cobalt(III) salts are dispersed as submicron particles throughout the film.

Citation Download Citation

Charles Kutal, Scott K. Weit, Robert D. Allen, Scott A. MacDonald, and C. Grant Willson "Novel base-generating photoinitiators for deep-UV lithography", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46384

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