High degree of accuracy in flatness and parallelism of thin sapphire ring manufacture with double-sided lapping

Rang-Seng Chang; Der-Chin Chen

doi:10.1117/12.134869

1 January 1992 High degree of accuracy in flatness and parallelism of thin sapphire ring manufacture with double-sided lapping

Rang-Seng Chang, Der-Chin Chen

Author Affiliations +

Proceedings Volume 1531, Advanced Optical Manufacturing and Testing II; (1992) https://doi.org/10.1117/12.134869
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

In this paper, we design a new double-sided lapping method that can accurately and efficiently lap extremely hard sapphire plates. We use a chemo-mechanical polishing method for the final polishing to get a scratch-free surface.

Citation Download Citation

Rang-Seng Chang and Der-Chin Chen "High degree of accuracy in flatness and parallelism of thin sapphire ring manufacture with double-sided lapping", Proc. SPIE 1531, Advanced Optical Manufacturing and Testing II, (1 January 1992); https://doi.org/10.1117/12.134869

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available