Photolithographic imaging of computer-generated holographic optical elements

Felix P. Shvartsman; Moshe Oren

doi:10.1117/12.50650

1 December 1991 Photolithographic imaging of computer-generated holographic optical elements

Felix P. Shvartsman, Moshe Oren

Proceedings Volume 1555, Computer and Optically Generated Holographic Optics; 4th in a Series; (1991) https://doi.org/10.1117/12.50650
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

A new photo-lithographic imaging (PLI) method to produce high efficiency volume phase-only CGH has been developed. PLI technique utilizes Du Pont proprietary materials and processes to replicate a binary intensity CGH, recorded on a chrome photomask-master, into a dry photopolymer. By changing the refractive index of the photopolymer in the imaged areas the intensity modulated pattern in the chrome photomask-master is converted into a volume phase modulated pattern with a single lithographic step. This technique was used to fabricate a variety of computer generated holographic optical element (CGHOE), such as on-axis and off- axis Fresnel zone plates and array illuminators. Diffraction efficiencies up to 98% were observed for a CGHOE consisting of a 10 X 10 array of off-axis Fresnel zone plates. Such CGHOEs can be fabricated on a variety of substrates and in different configurations, providing substantial technological and economical advantages over existing conventional manufacturing techniques for diffractive binary CGHOEs.

Citation Download Citation

Felix P. Shvartsman and Moshe Oren "Photolithographic imaging of computer-generated holographic optical elements", Proc. SPIE 1555, Computer and Optically Generated Holographic Optics; 4th in a Series, (1 December 1991); https://doi.org/10.1117/12.50650

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