Sputtered NiOx thin films as electrochromic materials

Yueyan Shi; Yimin Yang; Zhiqiang Yin

doi:10.1117/12.130550

25 November 1992 Sputtered NiOx thin films as electrochromic materials

Yueyan Shi, Yimin Yang, Zhiqiang Yin

Proceedings Volume 1728, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Chromogenics for Smart Windows; (1992) https://doi.org/10.1117/12.130550
Event: Optical Materials Technology for Energy Efficiency and Solar Energy, 1992, Toulouse-Labege, France

Abstract

Ni-O thin films have been produced onto ITO coated glass using the dc magnetron sputtering technique. The colored and bleached states of Ni-O films have been obtained by applying alternatively a positive 0.8 V potential and a negative 1.0 V potential to the sample (WE). Normal transmittance of Ni-O films in the colored and bleached states have been measured in the wavelength range of 0.35 - 2.5 micrometers by spectrophotometer.

Citation Download Citation

Yueyan Shi, Yimin Yang, and Zhiqiang Yin "Sputtered NiOx thin films as electrochromic materials", Proc. SPIE 1728, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Chromogenics for Smart Windows, (25 November 1992); https://doi.org/10.1117/12.130550

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