Quarter-micron lithography using a deep-UV stepper with modified illumination

Anthony Yen; William N. Partlo; Shane R. Palmer; Maureen A. Hanratty; Michael C. Tipton

doi:10.1117/12.150421

8 August 1993 Quarter-micron lithography using a deep-UV stepper with modified illumination

Anthony Yen, William N. Partlo, Shane R. Palmer, Maureen A. Hanratty, Michael C. Tipton

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150421
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We have investigated the use of annular illumination on a KrF excimer laser stepper ((lambda) equals 248 nm) working near the resolution limit of the lens. The numerical aperture of the lens was 0.48 and the illuminator-lens combination produced a partial coherence of 0.44. With a central obscuration equal to 75% of the diameter of the illuminator aperture in place and using a surface-imaging resist process, we have increased the depth of focus for 0.25 micrometers dense lines and spaces from 0.9 micrometers at one point in the imaging field to 1.5 micrometers . Performance for dense contacts was also improved. These improvements demonstrate the feasibility of 0.25 micrometers technology with deep-UV lithography.

Citation Download Citation

Anthony Yen, William N. Partlo, Shane R. Palmer, Maureen A. Hanratty, and Michael C. Tipton "Quarter-micron lithography using a deep-UV stepper with modified illumination", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150421

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