Fundamental process during pulsed-laser deposition of thin films

Rajiv K. Singh

doi:10.1117/12.167549

1 February 1994 Fundamental process during pulsed-laser deposition of thin films

Rajiv K. Singh

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167549
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

A model to estimate plasma absorption during deposition of thin films has been developed. In this model, the time-dependent plasma dimension is replaced by the time dependent ablation depth which can be determined by numerical simulations. A model to predict the spatial in- homogeneities in the laser-deposited films has also been developed.

Citation Download Citation

Rajiv K. Singh "Fundamental process during pulsed-laser deposition of thin films", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167549

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