Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films

Bradley J. Pond; Tu Du; J. Sobczak; Charles K. Carniglia

doi:10.1117/12.180926

28 July 1994 Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films

Bradley J. Pond, Tu Du, J. Sobczak, Charles K. Carniglia

Author Affiliations +

Proceedings Volume 2114, Laser-Induced Damage in Optical Materials: 1993; (1994) https://doi.org/10.1117/12.180926
Event: Laser-Induced Damage in Optical Materials: 1993, 1993, Boulder, CO, United States

Abstract

Films produced by reactive-dc-magnetron sputtering are generally dense and homogeneous. Thus their optical properties are similar to those of ion-beam-sputtered films and distinct from the properties of the more porous electron-beam evaporated films. In this paper, the measured results of the dispersive refractive index n and extinction coefficient k are presented for single- layer films of SiO₂, Al₂O₃, HfO₂, Ta₂O₅, Nb₂O₅, and TiO₂ produced by the three processes. For some of the magnetron-sputtered films, it was necessary to modulate the dc power supply in order to suppress the electrical arcing at the target.

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Bradley J. Pond, Tu Du, J. Sobczak, and Charles K. Carniglia "Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180926

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