Paper
28 July 1994 Long-term effects of pulsed KrF laser radiation on crystalline and amorphous SiO2
Douglas J. Krajnovich, Iraj K. Pour
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Abstract
At the 1992 Boulder DAmage Symposium, we reported test results for 6 fused silica glass types exposed to millions of KrF laser pulses at a fluence of 500 mJ/cm2 and a pulse repetition rate of 300 Hz. The peculiar results and the big variations between glass types (`slow' relaxing vs. `fast' relaxing glass families) were interpreted as being due to subtle differences in the glass microstructure induced by the homogenization and heat treatments, but no detailed explanation could be offered. As a small step toward improving our understanding, we have expanded our studies to include four additional glass types: Suprasil 300 (S300) and Suprasil 311 (S311) from Heraeus, and conventional 7940 and a new Excimer-grade fused silica from Corning.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Douglas J. Krajnovich and Iraj K. Pour "Long-term effects of pulsed KrF laser radiation on crystalline and amorphous SiO2", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180923
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KEYWORDS
Glasses

Silica

Ultraviolet radiation

Absorption

Crystals

Quartz

Hydrogen

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