Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters

Marcia L. Schilling; Howard Edan Katz; Francis M. Houlihan; Janet M. Kometani; Susan M. Stein; Omkaram Nalamasu

doi:10.1117/12.175335

16 May 1994 Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters

Marcia L. Schilling, Howard Edan Katz, Francis M. Houlihan, Janet M. Kometani, Susan M. Stein, Omkaram Nalamasu

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175335
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A new class of photodefinable polymers based on phosphonic acid esters has been developed. Photogenerated acid catalysts convert the esters to phosphonic acids in the exposed regions of films during post-exposure bake. Those phosphonic acids, in addition to providing the base-solubility necessary for positive-tone development, are also uniquely capable of binding metal ions and cations from solution. Preliminary lithographic evaluations indicate that these polymers generally show high contrast (approximately 10), good sensitivity, low volume loss (< 15 percent) and the potential for submicron resolution. More importantly, the patterned deposition of refractory metal ions has also been demonstrated which could be useful for at-the- surface imaging and circuit fabrication applications.

Citation Download Citation

Marcia L. Schilling, Howard Edan Katz, Francis M. Houlihan, Janet M. Kometani, Susan M. Stein, and Omkaram Nalamasu "Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175335

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