Formation of V1-xWx02 thermochromic films by reactive magnetron sputtering with an alloy target

Ping Jin; Kazuki Yoshimura; S. Iwama; Sakae Tanemura

doi:10.1117/12.217358

23 August 1995 Formation of V_1-xW_xO₂ thermochromic films by reactive magnetron sputtering with an alloy target

Ping Jin, Kazuki Yoshimura, S. Iwama, Sakae Tanemura

Proceedings Volume 2531, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV; (1995) https://doi.org/10.1117/12.217358
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The transition temperature (tau) _c of the V_1-xW_xO₂ films deposited by dual-target sputtering was precisely determined from the changes both in IR transmittance and in electrical resistivity against temperature. The relationship between x (0-0.026) in V_1-xW_xO₂ and (tau) _c(0-67 degree(s)C) in the most applicable range for window coatings was clarified and a confirmed. The V_1-xW_xO₂ films containing the desired tungsten doping amount were fabricated with reproducibility by sputtering of a V-W(1.6at.%) alloy target under optimal conditions. The (tau) _c reduction efficiency for the films deposited using alloy target is almost identical of that for the films deposited by dual-target sputtering. The V_1-xW_xO₂ films deposited using alloy target showed thermochroism comparative to those previously prepared by dual-target sputtering.

Citation Download Citation

Ping Jin, Kazuki Yoshimura, S. Iwama, and Sakae Tanemura "Formation of V_1-xW_xO₂ thermochromic films by reactive magnetron sputtering with an alloy target", Proc. SPIE 2531, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV, (23 August 1995); https://doi.org/10.1117/12.217358

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