Polygonal gratings for wafer scale one-to-many optical clock signal distribution

Ray T. Chen; O. Erchov; Luke A. Graham

doi:10.1117/12.221200

18 September 1995 Polygonal gratings for wafer scale one-to-many optical clock signal distribution

Ray T. Chen, O. Erchov, Luke A. Graham

Proceedings Volume 2638, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II; (1995) https://doi.org/10.1117/12.221200
Event: Microelectronic Manufacturing '95, 1995, Austin, TX, United States

Abstract

In contrast to volume holographic material where 1-to-many fanouts are realized using multiplexed volume holograms, we report in this paper the first Si-based surface relief polygonal gratings aiming at optical clock signal distribution application. Surface relief grating with 1 micrometers period (0.5 micrometers feature size) was fabricated using reactive ion beam etch. Both hexagonal and square gratings were demonstrated for 1-to-4 and 1-to-6 fanouts. Surface- normal input and output coupling schemes were carried out with efficiency as high as 65%. Employment of substrate modes in silicon instead of the guided modes greatly releases the required grating spacing for the demonstrated two-way surface-normal coupling. Clock signal distribution operating at 1.3 micrometers with 7.5 GHz clock speed was demonstrated with signal to noise ratio as high as 60 dB.

Citation Download Citation

Ray T. Chen, O. Erchov, and Luke A. Graham "Polygonal gratings for wafer scale one-to-many optical clock signal distribution", Proc. SPIE 2638, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II, (18 September 1995); https://doi.org/10.1117/12.221200

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