High average power KrF laser-plasma x-ray source for lithography at 1nm wavelength

I. C. E. Turcu

doi:10.1117/12.2316271

1 September 1996 High average power KrF laser-plasma x-ray source for lithography at 1nm wavelength

I. C. E. Turcu

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 2778G6 (1996) https://doi.org/10.1117/12.2316271
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

A laser-plasma X-ray source has been developed at the Rutherford Appleton Laboratory for application to x-ray lithography at 0.18μm and beyond, as well as for generation of deep structures. This source provides a calibrated X-ray output of up to 1W (average power) 1nm wavelength (Cu L-shell emission) and 1.5W @ 1.4nm (Fe L-shell)¹. Fig. 1 shows a schematic of the RAL laser-plasma x-ray source.

Citation Download Citation

I. C. E. Turcu "High average power KrF laser-plasma x-ray source for lithography at 1nm wavelength", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778G6 (1 September 1996); https://doi.org/10.1117/12.2316271

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