A research is conducted on the axially symmetric four-mirror system for soft X-ray (λ=13nm) projection lithography. As the four-spherical mirror system has 8 design-parameters (4 curvatures and 4 distances), but having 7 constraints1 from nearly zero third-order aberrations2 (ΣjV=I∣Sj∣<10-6), a given reduction magnification, and scaling factor(c1=-1), the number of the remaining free design-parameter is one, for instance, d0 (the distance of object to the first mirror surface) in this work.
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