Etching of organic optical materials by photo-material processing using an excimer lamp

Atsushi Yokotani; Noritaka Takezoe; Kou Kurosawa; Wataru Sasaki; Tatsushi Igarashi; Hiromitsu Matsuno; Kunio Yoshida; Takatomo Sasaki

doi:10.1117/12.270269

4 April 1997 Etching of organic optical materials by photo-material processing using an excimer lamp

Atsushi Yokotani, Noritaka Takezoe, Kou Kurosawa, Wataru Sasaki, Tatsushi Igarashi, Hiromitsu Matsuno, Kunio Yoshida, Takatomo Sasaki

Author Affiliations +

Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270269
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom

Abstract

A dielectric barrier discharge type Xe excimer lamp has been used for etching of some organic materials which can be widely used for opt-electric applications. Using polymethylmetacrylate (PMMA) and polyimidic (PI) resin as samples, they were irradiated at an intensity of 12 mW/cm². In both cases, etch rates could be varied by changing the species and pressures of gases in the chamber. The maximum etch rates for PMMA and PI were approximately 7 and 10 nm/min, respectively. The etched surface was found to be very smooth compared to the surfaces etched by the ArF excimer laser. Because the excimer lamp produces incoherent radiation, uniform irradiation over a large area without speckling or interference fringe has been obtained. Furthermore, because the peak power of the lamp is significantly lower than that of excimer lasers, effective quantum effects and photochemical effects without thermal effects have been observed. We applied this technique for etching single crystalline organic opt-electric materials such as 1-arginin phosphate monohydrate and 1-histidine tetrafluoroborate.

Citation Download Citation

Atsushi Yokotani, Noritaka Takezoe, Kou Kurosawa, Wataru Sasaki, Tatsushi Igarashi, Hiromitsu Matsuno, Kunio Yoshida, and Takatomo Sasaki "Etching of organic optical materials by photo-material processing using an excimer lamp", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); https://doi.org/10.1117/12.270269

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available