Plasma study in laser ablation process for deposition

C. Vivien; Joerg Hermann; Chantal Boulmer-Leborgne

doi:10.1117/12.308640

26 May 1998 Plasma study in laser ablation process for deposition

C. Vivien, Joerg Hermann, Chantal Boulmer-Leborgne

Proceedings Volume 3404, ALT'97 International Conference on Laser Surface Processing; (1998) https://doi.org/10.1117/12.308640
Event: ALT '97 International Conference on Laser Surface Processing, 1997, Limoges, France

Abstract

In order to get a better inside in the reactive Pulsed Laser Deposition of nitride thin films, we performed time- and space-resolved plasma diagnostics during ablation of Ti, Al and C targets in low pressure nitrogen containing atmospheres using pulsed nanosecond UV lasers. In the case of carbon, thin films of C_xN_y were deposited on silicon substrates and characterized by Rutherford Backscattering Spectroscopy and Nuclear Reaction Analysis. With respect to irradiation of metal targets, during which a dense and highly ionized plasma was induced for laser intensities >= 100 MWcm^-2, much higher values >= 1 GWcm^-2 were necessary to induce significant plasma ionization on carbon. To increase the plasma reactivity in the case of carbon ablation, a radiofrequency discharge was added to excite and preionize the ambient gas. From correlation between the plasma characteristics and thin film analyses, conclusions could be made about the C_xN_y deposition process.

Citation Download Citation

C. Vivien, Joerg Hermann, and Chantal Boulmer-Leborgne "Plasma study in laser ablation process for deposition", Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); https://doi.org/10.1117/12.308640

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