Silicon microlenses for IR image sensors

Nuggehalli M. Ravindra; Fei Ming Tong; Dhiren K. Pattnaik; Dentcho I. Ivanov; Roland A. Levy; K. Aryusook; Vipulkumar Patel

doi:10.1117/12.324293

31 August 1998 Silicon microlenses for IR image sensors

Nuggehalli M. Ravindra, Fei Ming Tong, Dhiren K. Pattnaik, Dentcho I. Ivanov, Roland A. Levy, K. Aryusook, Vipulkumar Patel

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Proceedings Volume 3511, Micromachining and Microfabrication Process Technology IV; (1998) https://doi.org/10.1117/12.324293
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States

Abstract

We report a comprehensive approach to design, fabricate and characterize silicon microlenses for applications in IR image sensors. ZEMAX design tool was used to assist in the design of the lenses. Conventional photolithography and thermal reflow of melting resist technique were deployed to achieve spherical resist patterns. Reactive ion etching (RIE) was utilized for transfer of resist patterns to the substrate in O₂ and C₂F₆ environment. The shape of the fabricated lenses, i.e. radii of curvature and focal length were controlled within a wide range, by controlling the etch rates of resist and substrate, which were further controlled by varying the flow of gases, selectivity and power. Optical methods such as ray analysis and profilometry were used to obtain lens properties. Scanning electron microscopy was performed to analyze the morphology of the fabricated lenses.

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Nuggehalli M. Ravindra, Fei Ming Tong, Dhiren K. Pattnaik, Dentcho I. Ivanov, Roland A. Levy, K. Aryusook, and Vipulkumar Patel "Silicon microlenses for IR image sensors", Proc. SPIE 3511, Micromachining and Microfabrication Process Technology IV, (31 August 1998); https://doi.org/10.1117/12.324293

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KEYWORDS

Microlens

Silicon

Image sensors

Sensors

Microlens array

Photoresist materials

Reactive ion etching

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