Effective multisite CD correlation to maximize high-end tool utilization

John W. Duff; John Allsop

doi:10.1117/12.346211

23 April 1999 Effective multisite CD correlation to maximize high-end tool utilization

John W. Duff, John Allsop

Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346211
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

The semiconductor industry continues to accelerate its pace following the SIA roadmap. Many technical and business issues are exacerbated by this acceleration. One such obstacle that faces the mask making community touches on both the business and the technical aspects of the industry's desire to pull in the target dates for each roadmap node. In order to provide the industry with adequate high end capacity on a global basis, the multi-site global photomask company must routinely exercise inter-site transfer for the purpose of leveling the manufacturing loads during periods of peak regional demand. A crucial part of inter-site transfer is to ensure that common standards are used, the deviation from those standards are understood, and a statistics based methodology for correlating metrology equipment is developed. Minimizing critical dimension correlation deltas between sites is critical to successful load leveling in an era of ever shrinking error budgets. This paper will explore the methods and practices used by Photronics to achieve routine inter-site measurements correlations whose precision far exceeds those of the best available standards. Both the statistical methods employed and the results from a large sample of production plates will be reported.

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John W. Duff and John Allsop "Effective multisite CD correlation to maximize high-end tool utilization", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346211

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KEYWORDS

Metrology

Critical dimension metrology

Calibration

Photomasks

Manufacturing

Standards development

Excel

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