Higher-order aberration measurement with printed patterns under extremely reduced sigma illumination

Hiroshi Nomura; Kazuo Tawarayama; Takuya Kohno

doi:10.1117/12.354348

26 July 1999 Higher-order aberration measurement with printed patterns under extremely reduced sigma illumination

Hiroshi Nomura, Kazuo Tawarayama, Takuya Kohno

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354348
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Measurement techniques for higher order aberrations of a projection optical system in photolithographic exposure tools have been established. Even-type and odd-type aberrations are independently obtained from printed grouped lines on a wafer by three-beam interference under highly coherent illumination. Even-type aberrations, i.e. spherical aberration and astigmatism, are derived from the best focus position of vertical, horizontal and orthogonal grouped lines by an optical microscope. Odd-type aberrations, i.e. coma and trefoil, are obtained by detecting relative shifts of fine grouped lines to a large pattern by an overlay inspection tool. The qualitative diagnosis for lens aberrations was demonstrated to a krypton fluoride excimer laser scanner.

Citation Download Citation

Hiroshi Nomura, Kazuo Tawarayama, and Takuya Kohno "Higher-order aberration measurement with printed patterns under extremely reduced sigma illumination", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354348

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