Paper
13 December 1999 W-band MHEMT MMIC LNA
Kiuchul C. Hwang, Peter Chao, Paul Hoff
Author Affiliations +
Proceedings Volume 3861, Gigahertz Devices and Systems; (1999) https://doi.org/10.1117/12.373010
Event: Photonics East '99, 1999, Boston, MA, United States
Abstract
Excellent noise and gain have been demonstrated at W-band with metamorphic HEMTs MMICs. The performance of the low noise amplifier (LNA) MHEMTs is very close to that of InP HEMTs on InP substrate. The material structure of the MHEMT has been developed using an AlGaAsSb lattice strain relief buffer layer on a GaAs substrate. DC characteristics of the 0.1 X 36 micrometers devices have shown typical extrinsic transconductance (gm) of 1200 mS/mm to 1300 mS/mm depending on Indium mole fraction in the channel. Small- signal S-parameter measurements performed on the 0.1 X 36 micrometers devices exhibited an excellent fT of 225 GHz and Maximum Stable Gain of 12.9 dB at 60 GHz and 10.4 dB at 110 GHz. The 3-stage W-band LNA MMIC exhibits 4.2 dB noise figure with 18 dB gain at 82 GHz and 4.8 dB noise figure with 14 dB gain at 89 GHz.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kiuchul C. Hwang, Peter Chao, and Paul Hoff "W-band MHEMT MMIC LNA", Proc. SPIE 3861, Gigahertz Devices and Systems, (13 December 1999); https://doi.org/10.1117/12.373010
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KEYWORDS
Gallium arsenide

Field effect transistors

Semiconducting wafers

Indium

Aluminum

Doping

Etching

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