Potential of dry etching for the fabrication of fused silica micro-optical elements

Philippe Nussbaum; Kenneth J. Weible; Markus Rossi; Hans Peter Herzig

doi:10.1117/12.360533

31 August 1999 Potential of dry etching for the fabrication of fused silica micro-optical elements

Philippe Nussbaum, Kenneth J. Weible, Markus Rossi, Hans Peter Herzig

Proceedings Volume 3879, Micromachine Technology for Diffractive and Holographic Optics; (1999) https://doi.org/10.1117/12.360533
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

We report on recent progress in the fabrication of fused silica micro-optical elements, such as blazed gratings, refractive microlenses and microprisms. The elements are first made in photoresist and then they are transferred into fused silica by reactive ion etching. High selectivity etching is needed to realize structures with a high aspect ratio. Results are shown using various metallic etch masks. The shaping of optimized profiles is also presented to generate microlenses which are aspheric, or which have a low numerical aperture.

Citation Download Citation

Philippe Nussbaum, Kenneth J. Weible, Markus Rossi, and Hans Peter Herzig "Potential of dry etching for the fabrication of fused silica micro-optical elements", Proc. SPIE 3879, Micromachine Technology for Diffractive and Holographic Optics, (31 August 1999); https://doi.org/10.1117/12.360533

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