Spectroscopic investigation of SiO2 surfaces of optical materials for high-power lasers

Stavros G. Demos; Lynn Matthew Sheehan; Mark R. Kozlowski

doi:10.1117/12.387569

7 June 2000 Spectroscopic investigation of SiO₂ surfaces of optical materials for high-power lasers

Stavros G. Demos, Lynn Matthew Sheehan, Mark R. Kozlowski

Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000) https://doi.org/10.1117/12.387569
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States

Abstract

High quality surfaces of fused silica optical materials were studied using microscopic fluorescence imaging as well as Raman and emission micro-spectroscopy. For as-polished surfaces optically active defect formations were detected on the surface of the material which vary in geometry, relative intensity and concentration depending on the polishing process. A partial correlation of these defects with subsequent laser damage sites was indicated. Following laser-induced damage the Raman and photoluminescence spectra indicated extensive materials modification within the damage sites. Emission spectra show at least three characteristic luminescence bands centered at 1.9 eV, 2.2 eV and approximately 4.7 eV. Raman scattering indicates that laser irradiation leads to compaction.

Citation Download Citation

Stavros G. Demos, Lynn Matthew Sheehan, and Mark R. Kozlowski "Spectroscopic investigation of SiO₂ surfaces of optical materials for high-power lasers", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); https://doi.org/10.1117/12.387569

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