Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist

Joo Hyeon Park; Jae-Young Kim; Dong-Chul Seo; Sun-Yi Park; Hosull Lee; Seong-Ju Kim; Jae Chang Jung; Ki-Ho Baik

doi:10.1117/12.388281

23 June 2000 Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist

Joo Hyeon Park, Jae-Young Kim, Dong-Chul Seo, Sun-Yi Park, Hosull Lee, Seong-Ju Kim, Jae Chang Jung, Ki-Ho Baik

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388281
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Photoresist using maleic anhydride/cycloolefin copolymer is a leading candidate for the 193 nm photolithography. Until recently, the efforts to improve 193 nm photoresist have been focused on resolution and dry-etch resistance. Therefore, we have synthesized some kinds of matrix resins and additives containing alicyclic group and acid labile group. The matrix resin is alternating copolymer obtained by free radical polymerization of maleic anhydride and cycloolefinic derivatives. And, the additives have a low molecular weight containing alicyclic group and acid labile group. The additives not only serve as dissolution inhibitors but also improve the pattern profile and dry-etch resistance. In this paper, we will describe the approaches to the resist materials, which are involved in our photoacid generator concept.

Citation Download Citation

Joo Hyeon Park, Jae-Young Kim, Dong-Chul Seo, Sun-Yi Park, Hosull Lee, Seong-Ju Kim, Jae Chang Jung, and Ki-Ho Baik "Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388281

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