Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application

Nakgeuon Seong; Gisung Yeo; Hanku Cho; Joo-Tae Moon

doi:10.1117/12.389032

5 July 2000 Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application

Nakgeuon Seong, Gisung Yeo, Hanku Cho, Joo-Tae Moon

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389032
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Lens aberration has been a kind of nuisance for lithographers. As feature size is getting smaller, aberration caused malfunction is getting more important and should be considered for correct use of lens. Therefore, the accurate lens aberration measurements are needed to predict patterning characteristics of critical layer of a device at given lens and to decide whether the lens is usable for the device or not. In this paper, in-situ interferometer is used for aberration measurement and measured aberrations were compared with phase measurement interferometer data for accuracy evaluation. Finally, printed patterns and simulated results were compared. As a practical application of measured aberration, classification of lens for a given device was performed.

Citation Download Citation

Nakgeuon Seong, Gisung Yeo, Hanku Cho, and Joo-Tae Moon "Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389032

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