Pulsed UV laser Raman and fluorescence spectroscopy of large-area fused silica photomask substrates

Christian Muehlig; Sylvia Bark-Zollmann; Dieter Grebner; Wolfgang Triebel

doi:10.1117/12.389054

5 July 2000 Pulsed UV laser Raman and fluorescence spectroscopy of large-area fused silica photomask substrates

Christian Muehlig, Sylvia Bark-Zollmann, Dieter Grebner, Wolfgang Triebel

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389054
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Large area photomask substrates of fused silica and a size of up to 9 inches by 9 inches are locally evaluated by laser induced fluorescence and H₂ measurements. Using a narrow-bandwidth KrF excimer laser, pulsed UV Raman spectroscopy is applied to measure the content of molecular hydrogen as an indicator of laser durability. Due to expeditious H₂ measurements, this technique allows to determine the local H₂ concentrations across an entire 6 inch by 6 inch photomask substrate within one hour. ArF excimer laser induced fluorescence (LIF) measurements are applied to correlate the H₂ concentration and the laser induced defect formation in fused silica. In most cases the NBOH defect density, determine by the intensity of the peak at (lambda) equals 650 nm in the LIF spectrum, shows a symmetric curve across the substrate diagonals with its lowest values in the center. The associated H₂ concentrations are found to show a maximum in the center. Furthermore, pulsed UV Raman spectroscopy is used to monitor the H₂ concentration during irradiation with several 10⁵ pulses of high KrF laser fluence. At first a rise in the H₂ concentration is observed. After a maximum value further irradiation leads to a drop of molecular hydrogen within the illuminated volume.

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Christian Muehlig, Sylvia Bark-Zollmann, Dieter Grebner, and Wolfgang Triebel "Pulsed UV laser Raman and fluorescence spectroscopy of large-area fused silica photomask substrates", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389054

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KEYWORDS

Silica

Laser induced fluorescence

Raman spectroscopy

Photomasks

Pulsed laser operation

Excimer lasers

Ultraviolet radiation

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