Paper
7 February 2001 Novel micromachined sensor head for optical data storage applications
Christophe Mihalcea, M. Kuwahara, Junji Tominaga, Nobufumi Atoda
Author Affiliations +
Proceedings Volume 4085, Fifth International Symposium on Optical Storage (ISOS 2000); (2001) https://doi.org/10.1117/12.416870
Event: Fifth International Symposium on Optical Storage (IS0S 2000), 2000, Shanghai, China
Abstract
We report on a novel micromachined sensor head for optical data storage devices. The head is based on a 6 X 6 aperture array with subwavelength dimensions. In comparison to previously introduced flat-aperture heads, a tip-based array is presented which profits from a recently presented reliable fabrication process of apertures in the 100 nm regime and below. This fabrication process exploits inhomogeneous thickness distributions and modified etching rates of thermally generated siliconoxides on <001>-oriented silicon wafers at relatively low temperatures, and makes it possible to open apertures with dimensions below 150 nm in hollow SiO2 pyramidal shaped tips. A metallization process is finally used to provide optical opacity and to further reduce the overall aperture dimensions to less than 100 nm. The fabrication process of these sensors is described in detail and the results are confirmed by SEM photographs.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christophe Mihalcea, M. Kuwahara, Junji Tominaga, and Nobufumi Atoda "Novel micromachined sensor head for optical data storage applications", Proc. SPIE 4085, Fifth International Symposium on Optical Storage (ISOS 2000), (7 February 2001); https://doi.org/10.1117/12.416870
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KEYWORDS
Oxides

Head

Sensors

Silicon

Etching

Semiconducting wafers

Optical storage

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