Simulation of resolution enhancement in contact lithography by off-axis illumination

Yongkai Zhao; Huijie Huang; Dunwu Lu; Longlong Du; Cailai Yuan; Baocai Jiang; Runwen Wang

doi:10.1117/12.404850

20 October 2000 Simulation of resolution enhancement in contact lithography by off-axis illumination

Yongkai Zhao, Huijie Huang, Dunwu Lu, Longlong Du, Cailai Yuan, Baocai Jiang, Runwen Wang

Proceedings Volume 4226, Microlithographic Techniques in Integrated Circuit Fabrication II; (2000) https://doi.org/10.1117/12.404850
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore

Abstract

Intensity distribution on the wafer plane in contact printing system under off-axis illumination is derived based on the amplitude analytic expression for Fresnel-Kirchhoff diffraction. Numerical simulations have been done under various conditions. Resolution enhancement effects by off-axis illumination and its application are analyzed.

Citation Download Citation

Yongkai Zhao, Huijie Huang, Dunwu Lu, Longlong Du, Cailai Yuan, Baocai Jiang, and Runwen Wang "Simulation of resolution enhancement in contact lithography by off-axis illumination", Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); https://doi.org/10.1117/12.404850

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