Laser-induced EUV source for optics characterization

Sebastian Kranzusch; Klaus R. Mann

doi:10.1117/12.436688

20 August 2001 Laser-induced EUV source for optics characterization

Sebastian Kranzusch, Klaus R. Mann

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436688
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A laser-based EUV plasma source for diagnostics purposes was developed, which is going to be utilized primarily for characterization of EUV optical components and sensoric devices. The emission characteristics of the generated 13nm radiation is monitored by the help of different diagnostic tools, including a pinhole camera, an EUV spectrometer and various EUV photodiodes. Moreover, first wavefront measurements of EUV radiation were performed with the help of a specially designed wavefront analyzer based on the Hartmann-Shack principle, which was sensibilized for 13nm radiation.

Citation Download Citation

Sebastian Kranzusch and Klaus R. Mann "Laser-induced EUV source for optics characterization", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436688

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