157-nm Twyman-Green interferometer for lens testing

Bryan D. Statt; Paul G. Dewa; Stephen K. Mack; Horst Schreiber; Bryan D. Stone; Paul Jay Tompkins

doi:10.1117/12.435644

14 September 2001 157-nm Twyman-Green interferometer for lens testing

Bryan D. Statt, Paul G. Dewa, Stephen K. Mack, Horst Schreiber, Bryan D. Stone, Paul Jay Tompkins

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435644
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Full acceptance of 157nm technology for next generation lithography requires that critical optical components and systems be characterized at this wavelength. Some of the challenges inherent in the 157nm test regime include purged beam paths, a partially coherent and astigmatic light source, limitations in reflective and transmissive optical components, and immature CCD detector technology. A Twyman-Green interferometer specially devised for testing lithographic objective lenses and systems at 157nm that addresses these challenges is presented. A description of the design and components used is provided along with test results obtained with the interferometer.

Citation Download Citation

Bryan D. Statt, Paul G. Dewa, Stephen K. Mack, Horst Schreiber, Bryan D. Stone, and Paul Jay Tompkins "157-nm Twyman-Green interferometer for lens testing", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435644

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