Advanced F2-lasers for 157-nm lithography

Klaus Vogler; Ingo Klaft; Frank Voss; Igor Bragin; Elko Bergmann; Tamas Nagy; Norbert Niemoeller; Rainer Paetzel; Sergei V. Govorkov; Gongxue Hua

doi:10.1117/12.435652

14 September 2001 Advanced F₂-lasers for 157-nm lithography

Klaus Vogler, Ingo Klaft, Frank Voss, Igor Bragin, Elko Bergmann, Tamas Nagy, Norbert Niemoeller, Rainer Paetzel, Sergei V. Govorkov, Gongxue Hua

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435652
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

According to the SIA-Roadmap, the 157 nm wavelength of the F₂ laser is the most likely solution to extend the optical lithography for chip production from the critical dimensions of 100 nm down to the 50 nm node. The introduction of the 157 nm lithography for high volume mass production requires high power, high repetition rate F₂ lasers operating in the power range of more than 40 W or at repetition rates of more than 4 kHz. These leading specifications are combined with other challenging laser specifications on dose stability and bandwidth which must be realized within a very aggressive time line for the introduction of the full-field scanner systems in the year 2003. According to this roadmap of the tool suppliers Lambda Physik has now introduced a 2 kHz lithography-grade F₂ laser F2020 for further pilot scanner systems. In this report we present basic performance data of this single line 2 kHz F₂ laser and some typical results on key laser parameters which had been measured with new and improved metrology equipment. We demonstrate for the first time precise measurements on the correlation of the natural bandwidth versus pressure which had been performed with an ultrahigh resolution VUV spectrometer. In addition a new compact and transportable high resolution VUV spectrometer was used for analyses of spectral purity and line suppression ratio of the laser emission. The experimental setup and result of an absolute calibration of a power meter, for the first time directly performed at the true 157 nm wavelength, are presented.

Citation Download Citation

Klaus Vogler, Ingo Klaft, Frank Voss, Igor Bragin, Elko Bergmann, Tamas Nagy, Norbert Niemoeller, Rainer Paetzel, Sergei V. Govorkov, and Gongxue Hua "Advanced F₂-lasers for 157-nm lithography", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435652

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