Paper
9 April 2002 Initiation, growth, and mitigation of UV-laser-induced damage in fused silica
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Abstract
Laser damage of large fused silica optics initiates at imperfections. Possible initiation mechanisms are considered. We demonstrate that a model based on nanoparticle explosions is consistent with the observed initiation craters. Possible mechanisms for growth upon subsequent laser irradiation, including material modification and laser intensification, are discussed. Large aperture experiments indicate an exponential increase in damage size with number of laser shots. Physical processes associated with this growth and a qualitative explanation of self-accelerated growth is presented. Rapid growth necessitates damage growth mitigation techniques. Several possible mitigation techniques are mentioned, with special emphasis on CO2 processing. Analysis of material evaporation, crack healing, and thermally induced stress are presented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander M. Rubenchik and Michael D. Feit "Initiation, growth, and mitigation of UV-laser-induced damage in fused silica", Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); https://doi.org/10.1117/12.461680
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Cited by 45 scholarly publications.
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KEYWORDS
Absorption

Silica

Plasma

Electrons

Polishing

Laser induced damage

Ionization

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