Ultrafast laser microstructuring for x-ray optics

D. G. Papazoglou; Alexandra Manousaki; I. Zergioti; Eva Majkova; Stefan Luby; Costas Fotakis

doi:10.1117/12.486519

19 February 2003 Ultrafast laser microstructuring for x-ray optics

D. G. Papazoglou, Alexandra Manousaki, I. Zergioti, Eva Majkova, Stefan Luby, Costas Fotakis

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486519
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

The ultrashort laser microstructuring of multilayer gratings for X-Ray optics is presented in this paper. A micromachining system operating with a KrF laser at 0.5 ps pulse duration and a high reduction ratio (÷30) optical projection system was used to etch grating structures on Si/Mo multilayer with lateral period of 1.5 m. Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Reflectivity were used to characterize the microetched patterns. Gratings with over 100 lines of 0.8μm×700μm were fabrication at low laser fluences (<600mJ/cm²). The roughness of the grating was measured from 0.5 nm to 1 nm for the shallow grooves (depth=4-5nm). The X-Ray reflectivity measurements confirmed the well-preserved multilayer structure. The ω scans around the 1^st Bragg maximum have shown diffraction peaks up to the 3^rd order on both sides with positions corresponding to the grating period. The use of sub-picosecond laser pulses minimizes the thermal affected zone and enhances the quality of the etched features. The ultrashort laser micromachining is advantageous for the fabrication of high spatial resolution microstructures required in the X-Ray optics industry.

Citation Download Citation

D. G. Papazoglou, Alexandra Manousaki, I. Zergioti, Eva Majkova, Stefan Luby, and Costas Fotakis "Ultrafast laser microstructuring for x-ray optics", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486519

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
4 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Diffraction gratings

X-rays

Multilayers

Silicon

X-ray optics

Satellites

Etching

Show All Keywords

Keywords/Phrases

Search In:

Publication Years