Paper
29 August 2002 Fabrication and measurement of polymer/Si arrayed waveguide grating multiplexer
Fei Wang, Yu Zhao, Daming Zhang, Zhanchen Cui, Maobin Yi, Shiyong Liu, Wei Sun
Author Affiliations +
Proceedings Volume 4905, Materials and Devices for Optical and Wireless Communications; (2002) https://doi.org/10.1117/12.480995
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China
Abstract
In this paper, a 9 X 9 Polymer/Si AWG was designed and fabricated. The cladding material is poly-methyl-methacrylate-co-glyciclyl methacrylate (PMMA-GMA) and the core material is the mixture of PMMA-GMA and bis-phonel-A epoxy. During the fabrication process of the Polymer/Si AWG device, We used aluminum as mask on polymer instead of conventional photoresist as mask. The results show that the device is good for the wavelength division multiplexing (WDM) system. The output characteristics of the device were measured by a system based on the tapered fiber. The results show that our polymer/Si AWG meets the designed device well.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fei Wang, Yu Zhao, Daming Zhang, Zhanchen Cui, Maobin Yi, Shiyong Liu, and Wei Sun "Fabrication and measurement of polymer/Si arrayed waveguide grating multiplexer", Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); https://doi.org/10.1117/12.480995
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KEYWORDS
Waveguides

Polymers

Polymer multimode waveguides

Multiplexers

Photomasks

Aluminum

Wavelength division multiplexing

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