Paper
2 June 2003 Accuracy limitations in specular-mode optical topography extraction
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Abstract
Specular-mode spectroscopic ellipsometry (SE) or reflectometry (SR) from periodic gratings have been successfully demonstrated as accurate methods for extracting detailed topography of integrated circuit structures. However, as critical dimensions become very much less than the current minimum measurement wavelengths and as film thicknesses are simultaneously reduced, there are significant questions regarding the long-term usefulness of this method. In this paper, I will attempt to address some major aspects of this problem.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fred Lewis Terry Jr. "Accuracy limitations in specular-mode optical topography extraction", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.488484
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Cited by 5 scholarly publications and 1 patent.
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KEYWORDS
Data modeling

Photoresist materials

Diffraction gratings

Silicon

Spectroscopic ellipsometry

In situ metrology

Scanning electron microscopy

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