Wall shear stress and pressure sensor development for active control of flow

Dimitrios M. Tsamados; Delphine Meunier; Mourad Laghrouche; Jumana Boussey; Sedat F. Tardu

doi:10.1117/12.524533

30 December 2003 Wall shear stress and pressure sensor development for active control of flow

Dimitrios M. Tsamados, Delphine Meunier, Mourad Laghrouche, Jumana Boussey, Sedat F. Tardu

Proceedings Volume 5342, Micromachining and Microfabrication Process Technology IX; (2003) https://doi.org/10.1117/12.524533
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

In this paper we present a technology for wall shear stress and pressure integrated sensor fabrication. Thanks to the use of SOI wafers and wafer bonding technique, we came up with an innovative technology that provides high on-chip density of sensors required for arrays utilized in numerous microfluidic applications like active control of flow. At the end some wall shear stress results are presented.

Citation Download Citation

Dimitrios M. Tsamados, Delphine Meunier, Mourad Laghrouche, Jumana Boussey, and Sedat F. Tardu "Wall shear stress and pressure sensor development for active control of flow", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.524533

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