Paper
29 December 2003 Inadvertent and intentional subwavelength surface texture on micro-optical components
Shanalyn A. Kemme, David W. Peters, Tony R. Carter, Sally Samora, Douglas S. Ruby, Saleem H. Zaidi
Author Affiliations +
Abstract
We will discuss the fabrication of several diffractive optical elements (DOEs) for projects at Sandia National Laboratories, which highlight the relative importance of subwavelength surface texture in the componentsi’ performance. This surface texture is in addition to the larger, anisotropic DOE features that manipulate the propagating orders, and is commonly referred to as grass. Surface texture on amorphous or multi-crystalline material is readily apparent in a scanning electron micrograph and is often an unavoidable consequence of the reactive ion etch (RIE) process. Contributing factors are mask erosion, self-masking, and material non-uniformity. In this presentation, we describe and quantify the effects of unavoidable and deliberate surface texture through several projects in progress at Sandia National Laboratories.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shanalyn A. Kemme, David W. Peters, Tony R. Carter, Sally Samora, Douglas S. Ruby, and Saleem H. Zaidi "Inadvertent and intentional subwavelength surface texture on micro-optical components", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.524606
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Cited by 4 scholarly publications.
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KEYWORDS
Silica

Reflectivity

Silicon

Reactive ion etching

Scanning electron microscopy

Etching

Reflection

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