Paper
20 May 2004 Nanostructuring of polymers by hot embossing lithography
Hella-Christin Scheer, Thomas Glinsner, Matthias Wissen, Rainer Pelzer
Author Affiliations +
Abstract
While researchers of ever more advanced NGL systems are still struggling to demonstrate the feasibility to manufacture features well below 100 nm at an affordable cost and a reasonable throughput, nanoimprint technologies are emerging as a possible answer to these challenges. 100 nm patterns are imprinted with a fully patterned 4 inch diameter stamp in a low-temperature embossing process. In low temperature imprinting processes with polymers having very low glass transition temperatures heating and cooling cycles are minimized. This enables to increase the throughput of a hot embossing process, which is important for potential industrial applications.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hella-Christin Scheer, Thomas Glinsner, Matthias Wissen, and Rainer Pelzer "Nanostructuring of polymers by hot embossing lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535741
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polymers

Lithography

Nanoimprint lithography

Glasses

Nanostructuring

Scanning electron microscopy

Manufacturing

RELATED CONTENT

Nanoimprint lithography for microfluidics manufacturing
Proceedings of SPIE (December 20 2013)
On the evolution of wafer level cameras
Proceedings of SPIE (February 14 2011)
Mix and match of nanoimprint and UV lithography
Proceedings of SPIE (August 20 2001)
Microfluidic technology and polymer nanoimprinting
Proceedings of SPIE (September 28 2001)
Current status of Nanonex nanoimprint solutions
Proceedings of SPIE (May 20 2004)

Back to Top