The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep-UV photoresist

Liyuan Wang; Wenjun Wang; Xin Guo

doi:10.1117/12.534513

14 May 2004 The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep-UV photoresist

Liyuan Wang, Wenjun Wang, Xin Guo

Author Affiliations +

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.534513
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A few kinds of N-hydroxy maleopimarimide sulfonate derivatives were synthesized. These compounds have high solubility in commonly used solvents and high thermal stability. The UV absorption properties of these compounds in polyethylene glycol film indicate that they have suitable absorption and transparency at 193 nm wavelength. The photolysis and lithography of these compounds under radiation of low pressure Hg lamp were studied.

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Liyuan Wang, Wenjun Wang, and Xin Guo "The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep-UV photoresist", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.534513

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