DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen; Mats Ekberg; Thomas Öström; Hans A. Fosshaug; Johan Karlsson; Charles Björnberg; Fredrik K. Nikolajeff; Mikael Karlsson

doi:10.1117/12.535767

28 May 2004 DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen, Mats Ekberg, Thomas Öström, Hans A. Fosshaug, Johan Karlsson, Charles Björnberg, Fredrik K. Nikolajeff, Mikael Karlsson

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.535767
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

This paper treats a for the semiconductor industry somewhat different application: The first-ever manufacture of Diffractive Optical Elements (DOE’s) as directly written multilevel diffractive micro-reliefs using the DUV SLM-based Sigma7300 Mask. The reliefs were manufactured in the DUV Chemically Amplified Resist (CAR) FEP-171. This particular application is of direct interest since DOE’s are already incorporated in the Sigma7300 system. The design and manufacture are demonstrated with (1.) A Fan-out element and (2.) A logotype generator. The first attempts, reported here, resulted in a Fan-out element with diffraction efficiency of 64% compared to the theoretical design of 88%.

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Peter Björnängen, Mats Ekberg, Thomas Öström, Hans A. Fosshaug, Johan Karlsson, Charles Björnberg, Fredrik K. Nikolajeff, and Mikael Karlsson "DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535767

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