Phase Transformation of Ge1Sb4Te7 Films Induced by Single Femtosecond Pulse

Qinfang Wang; Luping Shi; Sumei Huang; Xiangshui Miao; Tow Chong Chong

doi:10.1117/12.557108

9 September 2004 Phase transformation of Ge₁Sb₄Te₇ films induced by single femtosecond pulse

Qinfang Wang, Luping Shi, Sumei Huang, Xiangshui Miao, Tow Chong Chong

Proceedings Volume 5380, Optical Data Storage 2004; (2004) https://doi.org/10.1117/12.557108
Event: Optical Data Storage Topical Meeting, 2004, Monterey, California, United States

Abstract

Phase transformations of 100nm Ge₁Sb₄Te₇ films induced by single 130fs pulse at 800nm have been investigated with time-resolved microscope. With an average fluence of 30mJ/cm², a reflective intensity increase was observed within 1ps in 100nm as-deposited Ge₁Sb₄Te₇ films after excitation by intense femtosecond pulse, which was consistent to an electronically induced non-thermal phase transformation. XRD measurement confirmed that single femtosecond pulse could induce crystalline marks in 100nm as-deposited Ge₁Sb₄Te₇ films. Our results indicated that single femtosecond pulse could trigger both crystalline and amorphous phase in 100nm Ge₁Sb₄Te₇ films. The fluence for crystallization was higher than that for amorphization.

Citation Download Citation

Qinfang Wang, Luping Shi, Sumei Huang, Xiangshui Miao, and Tow Chong Chong "Phase transformation of Ge₁Sb₄Te₇ films induced by single femtosecond pulse", Proc. SPIE 5380, Optical Data Storage 2004, (9 September 2004); https://doi.org/10.1117/12.557108

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