Aberration Analysis From Diffraction Patterns Produced By Annular Apertures

Donald R. Erbschloe; James E. Harvey

doi:10.1117/12.949622

10 May 1986 Aberration Analysis From Diffraction Patterns Produced By Annular Apertures

Donald R. Erbschloe, James E. Harvey

Proceedings Volume 0560, Diffraction Phenomena in Optical Engineering Applications; (1986) https://doi.org/10.1117/12.949622
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

For points on and near the optical axis, asymptotic solutions to the Rayleigh-Sommerfeld diffraction integral are possible for annular apertures illuminated by plane waves of uniform intensity distribution containing rotationally symmetric Seidel aberrations (defocus and spherical aberration). Computer studies of these cases show excellent agreement with experiment. The amount of defocus and spherical aberration can be determined from shifts in positions of on-axis intensity extrema. An empirical study of the non-rotationally symmetric Seidel aberration astigmatism reveals a predictable change in the diffraction pattern allowing for the verification of the aberration to within .05 wavelengths.

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Donald R. Erbschloe and James E. Harvey "Aberration Analysis From Diffraction Patterns Produced By Annular Apertures", Proc. SPIE 0560, Diffraction Phenomena in Optical Engineering Applications, (10 May 1986); https://doi.org/10.1117/12.949622

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KEYWORDS

Monochromatic aberrations

Photography

Diffraction

Wavefronts

Optical engineering

Bessel functions

Information operations

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