Modeling the formation of photonic crystals by holographic lithography

Raymond C. Rumpf; Eric G. Johnson

doi:10.1117/12.601186

22 January 2005 Modeling the formation of photonic crystals by holographic lithography

Raymond C. Rumpf, Eric G. Johnson

Proceedings Volume 5720, Micromachining Technology for Micro-Optics and Nano-Optics III; (2005) https://doi.org/10.1117/12.601186
Event: MOEMS-MEMS Micro and Nanofabrication, 2005, San Jose, California, United States

Abstract

An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.

Citation Download Citation

Raymond C. Rumpf and Eric G. Johnson "Modeling the formation of photonic crystals by holographic lithography", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); https://doi.org/10.1117/12.601186

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