Measurements from a novel interferometer for EUVL mirror substrates

Max L. Krieg; Joseph J. M. Braat

doi:10.1117/12.612433

13 June 2005 Measurements from a novel interferometer for EUVL mirror substrates

Max L. Krieg, Joseph J. M. Braat

Proceedings Volume 5856, Optical Measurement Systems for Industrial Inspection IV; (2005) https://doi.org/10.1117/12.612433
Event: Optical Metrology, 2005, Munich, Germany

Abstract

A previously reported interferometer without intermediate optics is used to perform measurements on an aspherical extreme ultraviolet lithography mirror substrate. Acousto-optic modulation based phase shifting is used together with a novel phase retrieval algorithm to retrieve the phase distribution from our interferograms. The phase distribution is then processed by a previously reported inverse propagation algorithm to give the shape of the mirror under test. Our results are compared with measurements performed with conventional Fizeau interferometry and the discrepancies are discussed with reference to systematic error sources inherent in the classical and novel interferometers.

Citation Download Citation

Max L. Krieg and Joseph J. M. Braat "Measurements from a novel interferometer for EUVL mirror substrates", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); https://doi.org/10.1117/12.612433

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