Development of large aperture DOE for beam smoothing

Yong-Ping Li; Wei Zhang; Xiaobo Zhang; Fangjie Shu

doi:10.1117/12.615605

30 August 2005 Development of large aperture DOE for beam smoothing

Yong-Ping Li, Wei Zhang, Xiaobo Zhang, Fangjie Shu

Proceedings Volume 5876, Laser Beam Shaping VI; 58760O (2005) https://doi.org/10.1117/12.615605
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

A design of multi-step diffractive optical element (MDOE) is developed for the high power laser output smoothing. A hybrid algorithm is presented which inserts a quasi-optimum process in every iterative loop. This method of MDOE design saves the computing time tremendously. The top profile error (TPE) is about 8.4%, which looks inferior to what we have gotten in the earlier years with using continues profile design, but very easy in manufacture to match the design data. Now this MDOE with 16 steps on the surface of K9 glass can be realized with four masks' etching facility. The maximum etching error of the depth is 10-80nm, which is receivable with tolerance analyze in our design. The MDOE has 70mm diameter, and uniform illumination area is an Φ600μm spot. With using expanding 1.064 μm beam, the smoothing pattern in focus plane is measured. The result shows that the TPE is about 19%. It is believable that with the influence by the interaction of second hot electron and time domain smoothing this result is acceptable.

Citation Download Citation

Yong-Ping Li, Wei Zhang, Xiaobo Zhang, and Fangjie Shu "Development of large aperture DOE for beam smoothing", Proc. SPIE 5876, Laser Beam Shaping VI, 58760O (30 August 2005); https://doi.org/10.1117/12.615605

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KEYWORDS

Etching

Diffractive optical elements

Tolerancing

Lithium

Optical simulations

Error analysis

Manufacturing

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